Modutek Blog Why Quartz Baths Are Used in the Wafer Cleaning Process

The cleaning of silicon wafers during semiconductor manufacturing uses strong, corrosive chemicals to remove deposits from the surface of the silicon. Critical factors for effective cleaning are an absence of contamination in the chemical bath, the impervious nature of the ... Continue reading →The post Why Quartz Baths Are Used in the Wafer Cleaning Process appeared first on Modutek.